Physical properties of erbium implanted tungsten oxide films deposited by reactive dual magnetron sputtering

Thin Solid Films

Volumn 515, Issue 13, 2007, Pages 5264-5269

  Mohamed, Sodky H ^a,b   Anders, André ^a  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b Sohag University   (Egypt)

Author keywords

Dual magnetron sputtering; Electrical resistivity; Er ion implantation; Optical properties; Tungsten oxide films

Indexed keywords

ELECTRIC RESISTANCE; ERBIUM COMPOUNDS; ION IMPLANTATION; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; TUNGSTEN COMPOUNDS;

DUAL MAGNETRON SPUTTERING; ER ION IMPLANTATION; FILM DEPOSITION PARAMETERS; TUNGSTEN OXIDE FILMS;

THIN FILMS;

EID: 33947724850     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.12.179     Document Type: Article

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