Properties of zirconia thin films prepared by reactive magnetron sputtering

Materials Letters

Volumn 61, Issue 2, 2007, Pages 502-505

  Hembram, K P S S ^a   Mohan Rao, G ^a  

^a INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Dielectric constant; Reactive sputtering; Zirconia

Indexed keywords

DIELECTRIC MATERIALS; MAGNETRON SPUTTERING; PERMITTIVITY; SILICON; SUBSTRATES; THERMODYNAMICS; ZIRCONIA;

DIRECT TUNNELING CURRENT; REACTIVE MAGNETRON SPUTTERING; SILICON SUBSTRATE; ZIRCONIA THIN FILMS;

THIN FILMS;

EID: 37849187725     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matlet.2006.04.108     Document Type: Article

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