Novel ionic photoacid generators (PAGs) and corresponding PAG bound polymers

Journal of Photopolymer Science and Technology

Volumn 20, Issue 5, 2007, Pages 751-755

  Wang, Mingxing ^a   Yueh, Wang ^b   Gonsalves, Kenneth E ^a  

^a UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Anionic PAG; Lithography; Photoacid generator (PAG); Polymer resist

Indexed keywords

EID: 37549050502     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.751     Document Type: Article

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