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Volumn 155, Issue 2, 2008, Pages

Characterization of Ge1-xTex chalcogenide thin films deposited by MOCVD for phase change memory applications

Author keywords

[No Author keywords available]

Indexed keywords

CHALCOGENIDES; ELECTRODEPOSITION; ELECTRONIC STRUCTURE; FILM GROWTH; GALLIUM ALLOYS; PHASE CHANGE MEMORY;

EID: 37549032489     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2815603     Document Type: Article
Times cited : (12)

References (10)
  • 5
    • 33644778523 scopus 로고    scopus 로고
    • 1044-5803 10.1016/j.matchar.2005.11.020
    • M. S. Kim, Mater. Charact. 1044-5803 10.1016/j.matchar.2005.11.020, 56, 245 (2006).
    • (2006) Mater. Charact. , vol.56 , pp. 245
    • Kim, M.S.1
  • 10
    • 35648960287 scopus 로고    scopus 로고
    • 0021-8979 10.1063/1.2795673
    • R. Y. Kim, H. G. Kim, and S. G. Yoon, J. Appl. Phys. 0021-8979 10.1063/1.2795673, 102, 083531 (2007).
    • (2007) J. Appl. Phys. , vol.102 , pp. 083531
    • Kim, R.Y.1    Kim, H.G.2    Yoon, S.G.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.