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Volumn 155, Issue 2, 2008, Pages
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Characterization of Ge1-xTex chalcogenide thin films deposited by MOCVD for phase change memory applications
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Author keywords
[No Author keywords available]
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Indexed keywords
CHALCOGENIDES;
ELECTRODEPOSITION;
ELECTRONIC STRUCTURE;
FILM GROWTH;
GALLIUM ALLOYS;
PHASE CHANGE MEMORY;
CHALCOGENIDE THIN FILMS;
HOMOGENEOUS DISTRIBUTION;
TELLURIUM DEPOSITION;
TELLURIUM DEPOSITION TEMPERATURE;
THIN FILMS;
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EID: 37549032489
PISSN: 00134651
EISSN: None
Source Type: Journal
DOI: 10.1149/1.2815603 Document Type: Article |
Times cited : (12)
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References (10)
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