Characterization of helicon wave plasma designed for direct current sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2163-2168

  Zhang, J Q ^a   Setsuhara, Y ^a   Ariyasu, T ^b   Miyake, S ^a  

^a OSAKA UNIVERSITY   (Japan)

^b KANSAI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030516058     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580041     Document Type: Article

References (17)

1. R. S. Wise, D. P. Lymberopoulos, and D. J. Economou, Plasma Sources Sci. Technol. 4, 317 (1995).
2. L. Hinson, W. Class, and R. Sandstrom, in The Electrochemical Society Spring Meeting Extended Abstracts (The Electrochemical Society, New York, 1983), p. 254.
3. N. Sakudo, K. Togkiguchi, H. Koike, and I. Kanomata, Rev. Sci. Instrum. 48, 762 (1972).
4. K. Suzuki, K. Ninomiya, S. Nishimatsu, and S. Okudaira, J. Vac. Sci. Technol. B 3, 1025 (1985).
5. S. Kadlec and J. Musil, J. Vac. Sci. Technol. A 13, 389 (1995).
6. P. Kidd, J. Vac. Sci. Technol. A 9, 466 (1991).
7. J. E. Stevens, M. J. Sowa, and J. L. Cecchi, J. Vac. Sci. Technol. A 13, 2476 (1995).
8. A. Komori, T. Shoji, K. Miyamoto, J. Kawai, and Y. Kawai, Phys. Fluids B 3, 893 (1991).
9. R. W. Boswell, Plasma Phys. Controlled Fusion 26, 1147 (1984).
10. N. Jiwari, T. Fukasawa, H. Kawakami, H. Shindo, and Y. Horiike, J. Vac. Sci. Technol. A 12, 1322 (1994).
11. J. A. Lehane and P. C. Thonemann, Proc. Phys. Soc. 85, 301 (1965).
12. F. F. Chen, Plasma Phys. Controlled Fusion 33, 339 (1991).
13. T. Shoji, Y. Sakawa, S. Nakazawa, K. Kadota, and T. Sato, Plasma Sources Sci. Technol. 2, 5 (1993).
14. T. Tsukada, H. Nogami, Y. Nakagawa, and E. Wani, Jpn. J. Appl. Phys. 33, 4433 (1994).
15. R. W. Boswell and R. K. Porteous. Appl. Phys. Lett. 55, 1130 (1987).
16. F. F. Chen. J. Vac. Sci. Technol. A 10, 1389 (1992).
17. A. J. Perry, D. Vender, and R. W. Boswell, J. Vac. Sci. Technol. B 9, 310 (1991).