Novel diamantane polymer platform for resist applications

Journal of Photopolymer Science and Technology

Volumn 20, Issue 5, 2007, Pages 719-728

  Padmanaban, Munirathna ^a   Chakrapani, Srinivasan ^a   Lin, Guanyang ^a   Kudo, Takanori ^a   Parthasarathy, Deepa ^a   Anyadiegwu, Clement ^a   Antonio, Charito ^a   Dammel, Ralph ^a   Liu, Shenggao ^b   Lam, Frederick ^b   Maehara, Takayuki ^c   Iwasaki, Fumiaki ^c   Yamaguchi, Masao ^c  

^a AZ Electronic Materials USA Corp   (United States)

^b Chevron   (United States)

^c TOKUYAMA CORPORATION   (Japan)

Author keywords

Diamantane containing acrylate monomers; Litho and etch performance; Polymers; Resists

Indexed keywords

EID: 37549002448     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.719     Document Type: Article

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