Studies on photolithography and photoreaction of copolymer containing naphthyl in ultrathin nanosheets induced by deep UV irradiation

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 194, Issue 1, 2008, Pages 97-104

  Xu, Wenjian ^a,b,c   Li, Tiesheng ^a,b,c   Zeng, Gouliang ^a,b,c   Zhang, Suhua ^a   Shang, Wei ^a   Wu, Yangjie ^a,b,c   Miyashita, Tokuji ^d  

^a ZHENGZHOU UNIVERSITY   (China)

^b The Key Lab of Chemical Biology and Organic Chemistry of Henan Province   (China)

^c The Key Lab of Advanced Nano information Materials of Zhengzhou   (China)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

Langmuir Blodgett films; Naphthyl; Photochemistry; Photodecomposition; Photolithography; Polymer

Indexed keywords

EID: 37349007770     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2007.07.020     Document Type: Article

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