Synthesis of poly(2-trimethylsilyl-2-propyl methacrylate) and their application as a dry-developable chemically amplified photoresist

Polymer

Volumn 40, Issue 6, 1999, Pages 1617-1621

  Kim, Jin Baek ^a   Kim, Hyunwoo ^a   Choi, Jae Hak ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Chemically amplified resist; Dry developable resist; Silicon containing polymer

Indexed keywords

ANIONIC POLYMERIZATION; PHOTORESISTS; REACTIVE ION ETCHING; SILICON COMPOUNDS;

ALKYLSILANES; SILICON CONTAINING POLYMERS;

POLYACRYLATES;

POLY(2 TRIMETHYLSILYL 2 PROPYL METHACRYLATE); POLYMER; SILICON; UNCLASSIFIED DRUG;

ARTICLE; ELECTRONICS; SYNTHESIS;

EID: 0033102143     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0032-3861(98)00411-X     Document Type: Article

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