Helium-plasma-prepared (111)A HgCdTe and (211)B InSb

Journal of Electronic Materials

Volumn 37, Issue 2, 2008, Pages 152-156

  Martinka, Michael ^a   Jaime Vasquez, Marvin ^a   Stoltz, Andrew J ^a   Almeida, Leo A ^a   Benson, James D ^a   Varesi, John B ^a   Markunas, J K ^a  

^a NIGHT VISION AND ELECTRONIC SENSORS DIRECTORATE   (United States)

Author keywords

(111)A HgCdTe; (211)B InSb; Auger electron spectroscopy; Helium plasma; ISS; MBE CdTe; X ray; XPS

Indexed keywords

HELIUM PLASMA; HYDROGEN ARGON PLASMA PREPARATIONS; ION SCATTERING SPECTROSCOPY;

ANTIMONY COMPOUNDS; AUGER ELECTRON SPECTROSCOPY; HELIUM; SURFACE CHEMISTRY; WET ETCHING;

MERCURY (METAL);

EID: 37249052324     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-007-0309-z     Document Type: Article

References (25)

1. J.B. Varesi, J.D. Benson, M. Jaime-Vasquez, M. Martinka, A.J. Stoltz, J.H. Dinan, J. Electron. Mater. 35, 1443(2006)
2. P. Morgen, J.A. Silberman, I. Lindau, W.E. Spicer, J.A. Wilson, J. Vac. Sci. Technol. 21(1), 161(1982)
3. M. Jaime-Vasquez, M. Martinka, M. Groenert, J.H. Dinan, Appl. Phys. Lett. 88, 031910(2006)
4. H.H. Anderson and H. L. Bay, Sputtering by Particle Bombardment I, ed. R. Behrisch, Topics in Applied Physics (Berlin: Springer-Verlag, 1981) pp. 195-199
5. J.B. Malherb, "Sputtering of Compound Semiconductor Surfaces. I Ion-Solid Interactions and Sputter Yields", Critical Reviews in Solid State and Material Sciences (CRC Press Inc., 19(2), 1994) pp. 69-74, 104-109
6. A.J. Stoltz, M. Jaime-Vasquez, J.D. Benson, J.B. Varesi, M. Martinka, J. Electron. Mater. 35, 1461(2006)
7. A.D. Johnson, G.M. Williams, A.J. Pidduck, C.R. Whitehouse, T. Martin, C.T. Elliot and T. Ashley (7th Int. Conf. on Narrow Gap Semicond., Santa Fe, Inst. Phys. Conf. Ser. No. 144: section 4, 204, January 1995)
8. G.R. Bell, N.S. Kaijaks, R.J. Dixon,C.F. McConville Surf. Sci. 401(2), 125(1998)
9. J.D. Benson, J.B. Varesi, A.J. Stoltz, E.P.G. Smith, S.M. Johnson, M. Jaime-Vasquez, J.R. Markunas, L.A. Almeida, J.C. Molstad, J. Electron. Mater. 35, 1434 (2006)
10. Nina Veisfeld and Joseph D. Geller, J. Vac. Sci. Technol. A6, 2077 (1988)
11. Wolfgang Eckstein, "DB-Sputtering, Reflection and Range Values", IPP-Report 9/132 (2002), http://www.dpc.nifs.ac.jp/DB/Eckstein, Data & Planning Center, Nat. Inst. for Fusion Sci., Japan
12. T.P. Massopust, L.L. Kazmerski, J. Vac. Sci. Technol, A3, 955(1985)
13. M. Jaime-Vasquez, M. Martinka, R.N. Jacobs, M. Groenert, J. Electron. Mater. 35, 1455 (2006)
14. W.K. Liu, W.T. Yuen, R.A. Stradling, J. Vac. Sci. Technol. B13, 1539 (1995)
15. W.K. Liu, B. Santos, J. Vac. Sci. Technol. B14, 647 (1996)
16. J.F. Klem, J.Y. Tsao, J.L. Reno, A. Datye, S. Chadda, J. Vac. Sci. Technol. A9, 2996(1991)
17. F.D. Auret, J. Electrochem. Soc. 129, 2752 (1982)
18. W.F. Micklethwaite, private communication, Firebird Semiconductor, Ltd
19. T.D. Golding, M. Martinka, J.H. Dinan, J. Appl. 64, 1873(1988)
20. J. Huerta, M. Lopez, O. Zelaya-Angel, J. Vac. Sci. Technol. B18, 1716(2000)
21. J. Huerta, M. Lopez, O. Zelaya-Angel, Superficies y Vacio 9, 22-25 (1999)
22. W.J. Everson, C.K. Ard, J.L. Sepich, B.E. Dean, G.T. Neugebauer, H.F. Shaake, J. Electron. Mater. 24, 505 (1995)
23. Koichi Sugiyana, J. Crystal Growth 60, 450 (1982)
24. M. Martinka, L.A. Almeida, J.D. Benson, J.H. Dinan, J. Electron. Mater. 31, 732(2002)
25. J. H. Dinan, S.B. Qadri, Thin Solid Films 131, 267 (1985)