Investigation of HgCdTe surface films and their removal

Journal of Electronic Materials

Volumn 35, Issue 6, 2006, Pages 1443-1448

  Varesi, J B ^a   Benson, J D ^a   Jaime Vasquez, M ^a   Martinka, M ^a   Stoltz, A J ^a   Dinan, J H ^a  

^a US Army Research Development and Engineering Command   (United States)

Author keywords

HgCdTe; Native oxide; Spectroscopic ellipsometry; Surface analysis; X ray photoelectron spectroscopy

Indexed keywords

HGCDTE; NATIVE OXIDE; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ANALYSIS;

ACETONE; ATOMIC FORCE MICROSCOPY; CADMIUM; CHARACTERIZATION; ELLIPSOMETRY; ETHYLENE; MERCURY (METAL); METHANOL; SPECTROSCOPIC ANALYSIS; TELLURIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

INTERMETALLICS;

EID: 33746211395     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-006-0281-z     Document Type: Conference Paper

References (23)

1. U. Solzbach and H.J. Richter, Surf. Sci. 97, 191 (1980).
2. T.S. Sun, S.P. Buchner, and N.E. Byer, J. Vac. Sci. Technol. 17 (5), 1067 (1980).
3. S.P. Kowalczyk and J.T. Cheung, J. Vac. Sci. Technol. 18, 944 (1981).
4. G.D. Davis, T.S. Sun, S.P. Buchner, and N.e. Byer, J. Vac. Sci. Technol. 19, 472 (1981).
5. D.R. Rhiger and R.E. Kvaas, J. Vac. Sci. Technol. 21, 168 (1982).
6. B.K. Janousek and R.C. Carscallen, J. Vac. Sci. Technol. 21, 442 (1982).
7. S.P. Buchner, G.D. Davis, and N.B. Byer, J. Vac. Sci. Technol. 21, 446 (1982).
8. H. Arwin, D.E. Aspnes, and D.R. Rhiger, J. Appl. Phys. 54, 7132 (1983).
9. A.J. Ricco, H.S. White, and M.S. Wrighton, J. Vac. Sci. Technol., A 2, 910 (1984).
10. D.E. Aspnes and H. Arwin, J. Vac. Sci. Technol., A 2, 1309 (1984).
11. H. Arwin and D.E. Aspnes, J. Vac. Sci. Technol., A 2, 1316 (1984).
12. B.K. Janousek and R.C. Carscallen, J. Vac. Sci. Technol. A 3, 195 (1985).
13. J.F. Wager and D.R. Rhiger, J. Vac. Sci. Technol. A 3, 212 (1985).
14. G.P. Carey, A.K. Wahi, J.A. Silberman, C.M. Stahle, W.E. Spicer, and J.A. Wilson, J. Vac. Sci. Technol. A 5, 3203 (1987).
15. M. Seelman-Eggebert and H.J. Richter, J. Vac. Sci. Technol. A 6, 2699 (1988).
16. M. Seelman-Eggebert, G. Carey, V. Krishnamurthy, and C.R. Helms, J. Vac. Sci. Technol. B 10, 1297 (1992).
17. Y. Nemirovsky and G. Bahir, J. Vac. Sci. Technol. A 7, 450 (1989).
18. J.B. Varesi, J.D. Benson, M. Martinka, A.J. Stoltz, W.E. Mason, L.A. Almeida, A.W. Kaleczyk, P.R. Boyd, and J.H. Dinan, J. Electron. Mater. 34, 758 (2005).
19. J.F. Moulder, W.F. Stickle, P.E. Sobol, and K.D. Bomben, Φ Handbook of X-Ray Photoelectron Spectroscopy Eden Prairie, MN: Physical Electronics Inc., (1992).
20. NIST X-ray Photoelectron Spectroscopy Database, http://srdata.nist.gov/ xps/
21. D.R. Rhiger and R.E. Kvaas, J. Vac. Sci. Technol. A 1, 1712 (1983).
22. D.S. Robertson, N. Shaw, and I.M. Young, J. Mater. Sci. 13, 1986 (1978).
23. J.D. Benson, J.B. Varesi, A.J. Stoltz, E.P.G. Smith, S.M. Johnson, M. Martinka, M. Jaime-Vasquez, J.K. Markunas, L.A. Almeida, A.W. Kaleczyc, J.C. Molstad, W.E. Mason and J.H. Dinan, J. Electron. Mater. in this issue.