Application of optical filters fabricated by masked ion beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 6, 1996, Pages 3903-3906

  Morgan, M D ^a   Horne, W E ^a   Sundaram, V ^a   Wolfe, J C ^b   Pendharkar, S V ^b   Tiberio, R ^c  

^a EDTEK Inc   (United States)

^b UNIVERSITY OF HOUSTON   (United States)

^c Department of Theoretical and Applied Mechanics and the Cornell Nanofabrication Facility   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BANDPASS FILTERS; FABRICATION; GOLD; INFRARED DEVICES; ION BEAM LITHOGRAPHY; METALLIC FILMS; PERFORMANCE; PHOTOVOLTAIC CELLS; REACTIVE ION ETCHING; THIN FILMS;

INFRARED BANDPASS FILTER; ION EXPOSURE SYSTEM; MASKED ION BEAM LITHOGRAPHY; THERMOPHOTOVOLTAICS;

OPTICAL FILTERS;

EID: 0030286108     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588691     Document Type: Article

References (7)

1. S. T. Chase and R. D. Joseph, Appl. Opt. 11, 1775 (1983).
2. D. Johannsmann and D. Lemke, Infrared Phys. 25, 215 (1986).
3. W. E. Horne and M. D. Morgan, United States Patent Serial No. 08/ 423,957 (1996).
4. A. Schock, C. Or, and V. Kumar, 2nd NREL Conference on TPV Electricity Generation, Colorado Springs, CO, July 17-19, 1995.
5. E. Demichelis, M. Minetti-Mezzetti, M. Angello, and E. Tresso, J. Appl. Phys. 53, 9098 (1982).
6. W. E. Home, M. D. Morgan, P. R. Brothers, A. C. Day, and M. L. Thompson, Contract No. 959595, Final Report, prepared by The Boeing Company for Jet Propulsion Laboratory, 1993.
7. J. C. Wolfe, S. V. Pendharkar, P. Ruchhoeft, M. D. Morgan, W. E. Home, and R. C. Tiberio, J. Vac. Sci. Technol. B, these proceedings.