3D imprint technology using substrate voltage change

Applied Surface Science

Volumn 238, Issue 1-4 SPEC. ISS., 2004, Pages 324-330

  Taniguchi, Jun ^a   Iida, Masamichi ^a   Miyazawa, Takayuki ^a   Miyamoto, Iwao ^a   Shinoda, Kiyoshi ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b Tokatsu Technoplaza   (Japan)

Author keywords

Acceleration voltage; Electron beam lithography; Nanoimprint lithography; Spin on glass; Three dimensional surface fabrication

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC POTENTIAL; NANOTECHNOLOGY; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE CHEMISTRY;

ACCELERATION VOLTAGES; NANOPRINT LITHOGRAPHY (NIL); SPIN-ON-GLASS;

ELECTRON BEAM LITHOGRAPHY;

EID: 4644282885     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.05.220     Document Type: Conference Paper

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