Phase control in multiexposure spatial frequency multiplication

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 25, Issue 6, 2007, Pages 2439-2443

  Zhao, Yong ^a   Chang, Chih Hao ^a   Heilmann, Ralf K ^a   Schattenburg, Mark L ^a  

^a MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

FREQUENCY DOUBLING; GRATING PATTERNS; MULTIEXPOSURE SPATIAL FREQUENCY MULTIPLICATION; PHASE ERRORS;

FREQUENCY MODULATION; NONLINEAR DISTORTION;

PHASE CONTROL;

EID: 37149001518     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2794318     Document Type: Article

References (12)

1. R. K. Heilmann, C. G. Chen, P. T. Konkola and M. L. Schattenburg, Nanotechnology 0957-4484 10.1088/0957-4484/15/10/002 15, S504 (2004).
2. S. R. J. Brueck, " Optical and Interferometric Lithography- Nanotechnology Enablers., " in Proceedings of the IEEE, Oct. 2005, Vol. 93, p. 10.
3. D. C. Flanders, A. M. Hawryluk, and H. I. Smith, J. Vac. Sci. Technol. 0022-5355 10.1116/1.570362 16, 1949 (1979).
4. A. M. Hawruluk and H. I. Smith, Opt. Lett. 7, 402 (1982).
5. B. Cui, Z. Yu, H. Ge, and S. Y. Chou, Appl. Phys. Lett. 0003-6951 10.1063/1.2390652 90, 043118 (2007).
6. Z. Yu, W. Wu, L. Chen, and S. Y. Chou, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1409384 19, 2816 (2001).
7. S. H. Zaidi and S. R. J. Brueck, Proc. SPIE 0277-786X 10.1117/12.351110 3676, 371 (1999).
8. A. A. Freschi, F. J. dos Santos, E. L. Rigon, and L. Cescato, Opt. Commun. 0030-4018 10.1016/S0030-4018(02)01571-7 208, 41 (2002).
9. C. G. Chen, "Beam alignment and image metrology for scanning beam interference lithography-Fabricating gratings with nanometer phase accuracy," Ph.D. dissertation, Massachusetts Institute of Technology, June 2003.
10. P. T. Konkola, "Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions," Ph.D. dissertation, Massachusetts Institute of Technology, June 2003.
11. R. K. Heilmann, P. T. Konkola, C. G. Chen, G. S. Pati, and M. L. Schattenburg, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1410096 19, 2342 (2001).
12. A. Une, P. Kunyoo, M. Mochida, K. Yoshitomi, and S. Matsui, Microelectron. Eng. 61-62, 113 (2002).