A new vacuum pin chuck for ArF laser lithography

Microelectronic Engineering

Volumn 61-62, Issue , 2002, Pages 113-121

  Une, A ^a   Kunyoo, P ^a   Mochida, M ^a   Yoshitomi, K ^a   Matsui, S ^b  

^a NATIONAL DEFENSE ACADEMY   (Japan)

^b NTT CORPORATION   (Japan)

Author keywords

ArF laser lithography; Chucking accuracy; Flattening ability; Pin chuck; Wafer flatness

Indexed keywords

CERAMIC MATERIALS; DUST; EXCIMER LASERS; LITHOGRAPHY; PROTECTIVE COATINGS; SILICON CARBIDE; SURFACE ROUGHNESS; VACUUM TECHNOLOGY;

EXCIMER LASER LITHOGRAPHY;

MICROELECTRONICS;

EID: 0036643646     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(02)00457-4     Document Type: Conference Paper

References (1)