Ion beam modification of TiO2 films prepared by Cat-CVD for solar cell

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 810-813

  Narita, Tomoki ^a   Iida, Tamio ^a   Ogawa, Shunsuke ^a   Mizuno, Kouichi ^a   So, Jisung ^a   Kondo, Akihiro ^a   Yoshida, Norimitsu ^a   Itoh, Takashi ^a   Nonomura, Shuichi ^a   Tanaka, Yasuhito ^b  

^a GIFU UNIVERSITY   (Japan)

^b Department of Research and Development   (Japan)

Author keywords

Catalytic chemical vapor deposition; Conductivity; Ion bombardment; Optical properties; Titanium oxide; X ray photoelectron spectroscopy (XPS)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC CONDUCTIVITY; ION BEAMS; ION BOMBARDMENT; REFRACTIVE INDEX; SOLAR CELLS; TITANIUM OXIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

CATALYTIC CHEMICAL VAPOR DEPOSITION; DARK CONDUCTIVITY; ELECTRICAL CONDUCTIVITY; ELECTRICAL PROPERTIES;

METALLIC FILMS;

EID: 36749064408     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.179     Document Type: Article

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