Passivation Effect of Plasma Chemical Vapor Deposited SiNx on Single-Crystalline Silicon Thin-Film Solar Cells

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 8, 2003, Pages 5135-5139

  Yamamoto, Yukie ^a   Uraoka, Yukiharu ^a   Fuyuki, Takashi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Fixed charge; PECVD SiNx; Surface recombination velocity; Thin film solar cell

Indexed keywords

CRYSTALLINE MATERIALS; PASSIVATION; THIN FILMS; VAPOR DEPOSITION;

SURFACE RECOMBINATION VELOCITY;

SILICON SOLAR CELLS;

EID: 0142107394     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.5135     Document Type: Article

References (5)

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