On the origin of charging damage during etching of antenna structures

Journal of the Electrochemical Society

Volumn 144, Issue 10, 1997, Pages

  Hwang, Gyeong S ^a   Giapis, Konstantinos P ^a  

^a California Institute of Technology   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; DEFECTS; ELECTRON TUNNELING; MONTE CARLO METHODS; PLASMA ETCHING; SUBSTRATES;

ANTENNA STRUCTURES; CHARGING DAMAGE;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0031249208     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1838011     Document Type: Article

References (13)

1. K. Hashimoto, Jpn. J. Appl. Phys., 32, 6109 (1993); ibid., 33, 6013 (1994).
2. K. Hashimoto, Jpn. J. Appl. Phys., 32, 6109 (1993); ibid., 33, 6013 (1994).
3. G. S. Hwang and K. P. Giapis, Appl. Phys. Lett., 71, 458 (1997).
4. T. Nozawa, T. Kinoshita, T. Nishizuka, A. Narai, T. Inoue, and A. Nakaue, Jpn. J. Appl. Phys., 34, 2107 (1995).
5. G. S. Hwang and K. P. Giapis, J. Vac. Sci. Technol., B15, 70 (1997).
6. G. S. Hwang and K. P. Giapis, Appl. Phys. Lett., 71, In press.
7. S. Wolf, Silicon Processing for the VLSI Era, Vol. 3, Lattice Press, Sunset Beach, CA (1995).
8. Proceedings of the 1st (Santa Clara, 1996) and 2nd (Monterey, CA, 1997) International Symposium on Plasma Process-Induced Damage, Unpublished.
9. G. S. Hwang and K. P. Giapis, in 23rd Tegal Plasma Seminar Proceedings, pp. 79-90, San Francisco, CA, 1997, Unpublished.
10. T. Kinoshita, S. Krishnan, W. W. Dostalik, and J. P. McVittie, in 2nd International Symposium on Plasma Process-Induced Damage, p. 45, Monterey, CA, 1997.
11. S. Krishnan, W. W. Dostalik, K. Brennan, S. Aur, S. Rangan, and S. Ashok, Tech. Dig. Int. Electron Devices Meet., 731 (1996).
12. R. A. Gottscho, C. W. Jurgensen, and D. J. Vitkavage, J. Vac. Sci. Technol., B10, 2133 (1992), and references cited therein.
13. G. S. Hwang and K. P. Giapis, Appl. Phys. Lett., 70, 2377 (1997).