Stability and dynamics of frenkel pairs in Si

Physical Review Letters

Volumn 99, Issue 21, 2007, Pages

  Beck, M J ^a   Tsetseris, L ^a,b   Pantelides, S T ^a,c  

^a VANDERBILT UNIVERSITY   (United States)

^b ARISTOTLE UNIVERSITY OF THESSALONIKI   (Greece)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYOGENICS; DIFFUSION; THERMODYNAMIC PROPERTIES;

FRENKEL PAIRS; THERMAL INTERSTITIAL DIFFUSION;

SILICON;

EID: 36248955125     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.99.215503     Document Type: Article

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