Tailoring surface properties of ArF resists with functionally graded materials (FGM)

Journal of Photopolymer Science and Technology

Volumn 20, Issue 3, 2007, Pages 473-480

  Takemoto, Ichiki ^a   Ando, Nobuo ^a   Edamatsu, Kunishige ^a   Fuji, Yusuke ^a   Hashimoto, Kazuhiko ^a   Funase, Junji ^a   Yokoyama, Hiroyuki ^a  

^a SUMITOMO CHEMICAL CO LTD   (Japan)

Author keywords

Functionally graded material; Immersion resist; QSPR; Surface segregation

Indexed keywords

EID: 36148988473     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.20.473     Document Type: Article

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