Surface property control for 193nm immersion resist

Journal of Photopolymer Science and Technology

Volumn 19, Issue 4, 2006, Pages 565-568

  Irie, Makiko ^a   Endo, Kotaro ^a   Iwai, Takeshi ^a  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

Author keywords

Contact angle; Fluorine containing; Immersion lithography; Polymer blend

Indexed keywords

EID: 33748464722     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.19.565     Document Type: Article

References (4)

1. K. Ohmori, T. Ando, H. Tsuji, M. Yoshida, K. Ishizuka, T. Hirano, and H. Yokoya, "Top coat investigation for immersion specific issue prevention", International Symposium of Immersion Lithography, Bruges (2005).
2. K. Nakano, S. Nagaoka, S. Owa, and T. Yamamoto, "Defectively data taken with a full-field immersion exposure tool", International Symposium of Immersion Lithography, Bruges (2005).
3. K. Ohmori, T. Ando, T. Takayama, K. Ishizuka, M. Yoshida, Y. Utsumi, K. Endo and T. Iwai, Proc. SPIE 6153 (2006) in press.
4. T. Ogata, S. Matumaru, H. Shimizu, N. Kubota, H. Hada and M. Shirai, J. Photopolym. Sci. Technol., 17 (2004) 483.