Residual stress and hardness behaviors of the two-layer C/Si films

Surface and Coatings Technology

Volumn 202, Issue 4-7, 2007, Pages 1149-1153

  Chung, C K ^a   Peng, C C ^a   Wu, B H ^a   Chen, T S ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

a Si; Ion beam sputtering; Nanoindentation; Residual stress

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS SILICON; BUCKLING; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; HARDNESS; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; NANOINDENTATION; RESIDUAL STRESSES; SPUTTERING;

COMPRESSIVE RESIDUAL STRESS; ULTRA-HIGH-VACUUM ION BEAM SPUTTERING;

INORGANIC COATINGS;

AMORPHOUS CARBON; AMORPHOUS SILICON; BUCKLING; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; HARDNESS; INORGANIC COATINGS; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; NANOINDENTATION; RESIDUAL STRESSES; SPUTTERING;

EID: 36049033747     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.07.039     Document Type: Article

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