Nickel silicide nanocrystals embedded in SiO2 and HfO2 for nonvolatile memory application

Thin Solid Films

Volumn 516, Issue 2-4, 2007, Pages 360-363

  Yang, F M ^a   Chang, T C ^b,c   Liu, Po Tsun ^a   Yeh, Y H ^d   Yu, Y C ^e   Lin, J Y ^e   Sze, S M ^e   Lou, J C ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^c NATIONAL SUN YAT SEN UNIVERSITY   (Taiwan)

^d NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^e NATIONAL YUNLIN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

HfO2; Nanocrystals; Nonvolatile memory

Indexed keywords

CHARACTERIZATION; ELECTRIC PROPERTIES; HAFNIUM COMPOUNDS; NICKEL COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; THRESHOLD VOLTAGE;

MANUFACTURING TECHNOLOGY; NONVOLATILE MEMORY; NONVOLATILE MEMORY DEVICE; SEMICONDUCTOR INDUSTRY;

NANOCRYSTALS;

EID: 36048973859     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.131     Document Type: Article

References (15)

1. Kahng D., and Sze S.M. Bell Syst. Tech. J. 46 (1967) 1288
2. Blauwe J.D. IEEE Trans. Nanotechnol. 1 (2002) 72
3. Tiwari S., Rana F., Chan K., Hanafi H., Wei C., and Buchanan D. IEEE Int. Electron Devices Meet. Tech. Dig. (1995) 521
4. Liu Z., Lee C., Narayanan V., Pei G., and Kan E.C. IEEE Trans. Electron Devices 49 (2002) 1606
5. Kanjilal A., Hansen J.L., Gaiduk P., Larsen A.N., Cherkashin N., Claverie A., Normand P., Kapelanakis E., Skarlatos D., and Tsoukalas D. Appl. Phys. Lett. 82 (2003) 1212
6. King Y.C., King T.J., and Hu C. IEEE Int. Electron Devices Meet. Tech. Dig. (1998) 115
7. Tiwari S., Rana F., Chan K., Shi L., and Hanafi H. Appl. Phys. Lett. 69 (1996) 1232
8. Ostraat M., De Blauwe J., Green M., Bell D., Atwater H., and Flagan R. J. Electrochem. Soc. 148 (2001) 265
9. Chang T.C., Liu P.T., Yan S.T., and Sze S.M. Electrochem. Solid-State Lett. 8 (2005) G71
10. Chang T.C., Yan S.T., Hsu C.H., Tang M.T., Lee J.F., Tai Y.H., Liu P.T., and Sze S.M. Appl. Phys. Lett. 84 (2004) 2581
11. Yeh P.H., Yu C.H., Chen L.J., Wu H.H., Liu P.T., and Chang T.C. Appl. Phys. Lett. 87 (2005) 193504
12. Lee C.H., Hur S.H., Shin Y.C., Choi J.H., Park D.G., and Kim K. Appl. Phys. Lett. 86 (2005) 152908
13. Yeh P.H., Wu H.H., Yu C.H., Chen L.J., Liu P.T., Hsu C.H., and Chang T.C. J. Vac. Sci. Technol., A, Vac. Surf. Films 23 (2005) 851
14. Puzzilli G., and Irrera F. IEEE Trans. Electron Devices 53 (2006) 775
15. Park C.J., Cho H.Y., Kim S., Choi S.-H., Elliman R.G., Han J.H., Kim C., Hwang H.N., and Hwang C.C. J. Appl. Phys. 99 (2006) 036101