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Applied Physics A: Materials Science and Processing

Volumn 89, Issue 1, 2007, Pages 63-72

Optical, electrical, structural and microstructural characteristics of rf sputtered ITO films developed for art protection coatings

(4) Krasilnikova Sytchkova, A a Grilli, M L a Boycheva, S a,b Piegari, A a

a ENEA (Italy)

b TECHNICAL UNIVERSITY OF SOFIA (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; INDIUM COMPOUNDS; MICROSTRUCTURE; OPTICAL PROPERTIES; PROTECTIVE COATINGS; SPUTTERING; TIN;

DEPOSITION CONDITIONS; FILM PROPERTIES; MICROSTRUCTURAL CHARACTERISTICS; RF SPUTTERED ITO FILMS;

OXIDE FILMS;

EID: 36048945688 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-007-4058-x Document Type: Article

Times cited : (17)

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