An innovative understanding of metal-insulator-metal (MIM)-capacitor degradation under constant-current stress

IEEE Transactions on Device and Materials Reliability

Volumn 7, Issue 3, 2007, Pages 462-466

  Hung, Chi Chao ^b   Oates, Anthony S ^a,b   Lin, Horng Chih ^a,c   Chang, Yu En Percy ^b   Wang, Jia Lian ^b   Huang, Cheng Chung ^b   Yau, You Wen ^b  

^a IEEE   (Taiwan)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Capacitance; Constant current stress (CCS); Interface; Metal insulator metal (MIM)

Indexed keywords

CAPACITOR DEGRADATION; CONSTANT-CURRENT STRESS; DIELECTRIC BREAKDOWNS; METAL-INSULATOR-METAL;

CAPACITANCE; CURRENT DENSITY; DIELECTRIC MATERIALS; ELECTRIC INSULATORS; INTERFACES (MATERIALS); TRANSMISSION ELECTRON MICROSCOPY;

CAPACITORS;

EID: 35948951964     PISSN: 15304388     EISSN: 15304388     Source Type: Journal    
DOI: 10.1109/TDMR.2007.907406     Document Type: Article

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