Fast near field simulation of optical and EUV masks using the waveguide method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6533, Issue , 2007, Pages

  Evanschitzky, Peter ^a   Erdmann, Andreas ^a  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

Electromagnetic field solver; Image simulation; Near field simulation; Waveguide

Indexed keywords

CONVERGENCE OF NUMERICAL METHODS; ELECTROMAGNETIC FIELDS; EXTREME ULTRAVIOLET LITHOGRAPHY; IMAGE ANALYSIS; OPTICAL WAVEGUIDES;

ELECTROMAGNETIC FIELD SOLVER; IMAGE SIMULATION; NEAR FIELD SIMULATION;

MASKS;

EID: 35648960214     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.736978     Document Type: Conference Paper

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