Efficient and rigorous three-dimensional model for optical lithography simulation

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 13, Issue 11, 1996, Pages 2187-2199

  Lucas, Kevin D ^a   Tanabe, Hiroyoshi ^b   Strojwas, Andrzej J ^c  

^a MOTOROLA INC   (United States)

^b NEC CORPORATION   (Japan)

^c CARNEGIE MELLON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; COMPUTER SIMULATION; EIGENVALUES AND EIGENFUNCTIONS; LIGHT SCATTERING; MASKS; MATHEMATICAL MODELS; MAXWELL EQUATIONS; SEMICONDUCTOR DEVICE MANUFACTURE; THREE DIMENSIONAL;

PHOTOMASKS; TWO DIMENSIONAL; VECTOR POTENTIALS;

PHOTOLITHOGRAPHY;

EID: 0030288036     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.13.002187     Document Type: Article

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