On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition

Applied Physics Letters

Volumn 91, Issue 17, 2007, Pages

  Van Hattum, E D ^a   Palmero, A ^a,b   Arnoldbik, W M ^a   Rudolph, H ^a   Habraken, F H P M ^a  

^a UTRECHT UNIVERSITY   (Netherlands)

^b INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

CHARGE TRANSFER; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; SURFACE PLASMON RESONANCE; SURFACE STRUCTURE;

ARGON PRESSURE; MAGNETRON PLASMA SPUTTER DEPOSITION; NEUTRAL ATOM BOMBARDMENT; PLASMA POTENTIAL DISTRIBUTION; RESONANT CHARGE TRANSFER REACTIONS;

ION BOMBARDMENT;

EID: 35548953580     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2801514     Document Type: Article

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