Nitrogen partial pressure-dependent Mg concentration, structure, and optical properties of MgxZn1-xO film grown by magnetron sputtering

Journal of Materials Research

Volumn 22, Issue 10, 2007, Pages 2936-2942

  Cong, C X ^a,b   Yao, Bin ^a   Xie, Y P ^a   Xing, G Z ^a   Li, B H ^b   Wang, X H ^b   Wei, Z P ^b   Zhang, Z Z ^b   Lv, Y M ^b   Shen, D Z ^b   Fan, X W ^b  

^a JILIN UNIVERSITY   (China)

^b CHANGCHUN INSTITUTE OF OPTICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

FLOW RATE; MAGNETRON SPUTTERING; NITROGEN; OPTICAL PROPERTIES; PARTIAL PRESSURE; STRUCTURE (COMPOSITION);

PARTIAL PRESSURE RATIO; RADIO FREQUENCY MAGNETRON SPUTTERING;

MAGNESIUM COMPOUNDS;

EID: 35448952971     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2007.0375     Document Type: Article

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