Effects of modified precursor solution on microstructure of (Y,Yb)MnO 3/HfO2/Si

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 46, Issue 10 B, 2007, Pages 6956-6959

  Suzuki, Kazuyuki ^a   Kato, Kazumi ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

(Y,Yb)MnO3; Chemical solution deposition; Electrical property; HfO2; MFIS; Microstructure; Thin film

Indexed keywords

ELECTRIC PROPERTIES; MICROSTRUCTURE; THIN FILMS; YTTERBIUM COMPOUNDS;

ALKOXIDE SOLUTIONS; CHEMICAL SOLUTION DEPOSITION;

FERROELECTRIC MATERIALS;

EID: 35448938069     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.46.6956     Document Type: Article

References (19)

1. G. A. Smolenskii and V. A. Bokov: J. Appl. Phys. 35 (1964) 915.
2. J. L. Moll and Y. Tarui: IEEE Trans. Electron Devices 10 (1963) 338.
3. H. N. Lee, Y. T. Kim, and S. H. Choh: Appl. Phys. Lett. 76 (2000) 1066.
4. N. Fujimura, T. Ishida, T. Yoshimura, and T. Ito: Appl. Phys. Lett. 69 (1996) 1011.
5. D. Ito, N. Fujimura, K. Kakuno, and T. Ito: Ferroelectrics 271 (2002) 87.
6. S. Imada, T. Kuraoka, E. Tokumitsu, and H. Ishiwara: Jpn. J. Appl. Phys. 40 (2001) 666.
7. K. J. Choi, W. C. Shin, and S. G. Yoon: Thin Solid Films 384 (2001) 146.
8. N. Fujimura, H. Tanaka, H. Kitahata, K. Tadanaga, T. Yoshimura, T. Ito, and T. Minami: Jpn. J. Appl. Phys. 36 (1997) L1601.
9. H. Kitahata, K. Tadanaga, T. Minami, N. Fujimura, and T. Ito: Appl. Phys. Lett. 75 (1999) 719.
10. W. Yi, J. Choe, C. Moon, S. Kwun, and J. Yoon: Appl. Phys. Lett. 73 (1998) 903.
11. K. Suzuki, K. Nishizawa, T. Miki, and K. Kato: Key Eng. Mater. 214-215 (2002) 151.
12. K. Suzuki, K. Nishizawa, T. Miki, and K. Kato: Ferroelectrics 270 (2002) 99.
13. K. Suzuki, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Integrated Ferroelectr. 52 (2003) 55.
14. K. Suzuki, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Jpn. J. Appl. Phys. 42 (2003) 5692.
15. K. Suzuki, K. Tanaka, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Jpn. J. Appl. Phys. 42 (2003) 6007.
16. K. Suzuki, K. Tanaka, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Integrated Ferroelectr. 65 (2004) 117.
17. K. Suzuki, K. Tanaka, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Key Eng. Mater. 301 (2006) 65.
18. K. Suzuki, Y. Guo, D. Fu, K. Nishizawa, T. Miki, and K. Kato: Integrated Ferroelectr. 84 (2006) 121.
19. K. Suzuki and K. Kato: to be published in Integrated Ferroelectr.