Ferroelectricity of YMnO3 thin films on Pt(111)/Al2O3(0001) and Pt(111)/Y2O3(111)/Si(111) structures grown by molecular beam epitaxy

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 40, Issue 2 A, 2001, Pages 666-671

  Imada, Shogo ^a   Kuraoka, Takuya ^a   Tokumitsu, Eisuke ^a   Ishiwara, Hiroshi ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Epitaxial growth; Ferroelectric; Molecular beam epitaxy; Si; Y2O3; YMnO3

Indexed keywords

ALUMINA; EPITAXIAL GROWTH; FERROELECTRICITY; MOLECULAR BEAM EPITAXY; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; REMANENCE; THERMAL EXPANSION; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS;

CAPACITANCE-VOLTAGE CHARACTERISTICS; REMANENT POLARIZATION;

THIN FILMS;

EID: 0035246327     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.40.666     Document Type: Article

References (13)