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Plasmas and Polymers

Volumn 5, Issue 3-4, 2000, Pages 235-253

ESR study of the plasma polymerizations of trimethylsilane and methane

(3) Oldfield, F F a Cowan, D L a Yasuda, H K a

a UNIVERSITY OF MISSOURI (United States)

Author keywords

ESR; Free radical; Methane; PE; Plasma polymerization; Thin films; Trimethylsilane

Indexed keywords

DEPOSITION; FREE RADICALS; GLOW DISCHARGES; METHANE; PARAMAGNETIC RESONANCE; PLASMA APPLICATIONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYETHYLENES; REFRACTIVE INDEX; SILANES; THIN FILMS;

TRIMETHYLSILANES (TMS);

PLASMA POLYMERIZATION;

EID: 0034435620 PISSN: 10840184 EISSN: None Source Type: Journal
DOI: 10.1023/A:1011377900516 Document Type: Article

Times cited : (13)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.