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Volumn 44, Issue 1, 2002, Pages 37-47

Corrosion protection of ion vapor deposition (IVD) Al-coated Al alloys by low-temperature plasma interface engineering: Part III - DC cathodic polymerization in a closed reactor system

(5) Yu, Qingsong a Moffitt, C E b Wieliczka, D M b Deffeyes, Joan c Yasuda, Hirotsugu a

a University of Missouri (United States)

b UNIVERSITY OF MISSOURI KANSAS CITY (United States)

c BOEING COMPANY (United States)

Author keywords

Closed reactor system; Corrosion protection; DC plasma process; Interface engineering; IVD Al coated Al alloys

Indexed keywords

ADHESION; ALUMINUM; CHEMICAL REACTORS; CORROSION PROTECTION; PLASMAS; POLARIZATION; POLYMERIZATION; PROTECTIVE COATINGS; REFRACTIVE INDEX; STRUCTURE (COMPOSITION); VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC POLYMERIZATION; INTERFACE ENGINEERING; ION VAPOR DEPOSITION (IVD); PLASMA COATINGS;

ALUMINUM ALLOYS;

EID: 0036496148 PISSN: 03009440 EISSN: None Source Type: Journal
DOI: 10.1016/S0300-9440(01)00213-2 Document Type: Article

Times cited : (10)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.