dc cathodic polymerization of trimethylsilane in a closed reactor system

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 5, 2001, Pages 2163-2167

  Yu, Qingsong ^a   Moffitt, C E ^b   Wieliczka, D M ^b   Yasuda, Hirotsugu ^a  

^a University of Missouri   (United States)

^b UNIVERSITY OF MISSOURI KANSAS CITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ABLATION; CHEMICAL REACTORS; ELECTRODEPOSITION; INTERFACES (MATERIALS); SILANES; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

CATHODIC POLYMERIZATION; TRIMETHYLSILANES (TMS);

PLASMA POLYMERIZATION;

EID: 0035439971     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1378078     Document Type: Article

References (14)