Backscatteing effect in quantitative AES sputter depth profiling of multilayers

Surface and Interface Analysis

Volumn 39, Issue 10, 2007, Pages 787-797

  Hofmann, S ^a   Wang, J Y ^a   Zalar, A ^b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

Backscattering effect; MRI model; Multilayers; Sputter depth profiling

Indexed keywords

BACKSCATTERING; DEPTH PROFILING; MAGNETIC RESONANCE IMAGING; MATHEMATICAL MODELS; PARAMETER ESTIMATION; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

BACKSCATTERING DECAY; BACKSCATTERING EFFECT; MRI MODELS; SPUTTER DEPTH PROFILING;

MULTILAYERS;

EID: 35348931539     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2590     Document Type: Article

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