Implementing the electron backscattering factor in quantitative sputter depth profiling using AES

Surface and Interface Analysis

Volumn 39, Issue 4, 2007, Pages 324-330

  Hofmann, Siegfried ^a   Wang, Jiang Yong ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Electron backscattering; MRI model; Sputter depth profiling

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BACKSCATTERING; DEPTH PROFILING; INTERFACES (MATERIALS); SPUTTERING; SURFACE ROUGHNESS; TITANIUM DIOXIDE;

BACKSCATTERING EFFECTS; ELECTRON BACKSCATTERING; MIXING ROUGHNESS INFORMATION DEPTH (MRI) MODEL; SPUTTER DEPTH PROFILING;

ELECTRON SCATTERING;

EID: 34147193352     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.2503     Document Type: Article

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