Effect of deposition, sputtering, and evaporation of lithium debris buildup on EUV optics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Neumann, M J ^a   Cruce, M ^a   Brown, P ^a   Srivasta, S N ^a   Ruzic, D N ^a   Khodykin, O ^b  

^a University of Illinois at Urbana Champaign   (United States)

^b CYMER INC   (United States)

Author keywords

Debris; EUVL; Lithium; Mirror lifetime; Modeling; Optics; Secondary plasma

Indexed keywords

DEBRIS BUILDUP; LITHIUM DEBRIS BUILDUP; MIRROR LIFETIME; SECONDARY PLASMA;

DEBRIS; LITHIUM; OPTICAL MATERIALS; OPTICS; PROFILOMETRY; SPUTTERING;

EXTREME ULTRAVIOLET LITHOGRAPHY;

EID: 35148901053     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711033     Document Type: Conference Paper

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