Scanner overlay mix and match matrix generation; capturing all sources of variation

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5375, Issue PART 1, 2004, Pages 66-77

  DeMoor, Stephen ^a   Brown, Jay ^b   Robinson, John C ^c   Chang, Simon ^a   Tan, Colin ^a  

^a TEXAS INSTRUMENTS   (United States)

^b NIKON PRECISION INC   (United States)

^c KLA Tencor Austin   (United States)

Author keywords

Alignment; Metrology; Mix and match; Overlay; Scanner; Sources of variation; Stepper

Indexed keywords

MIX AND MATCH; OVERLAY; SCANNERS; SOURCE OF VARIATIONS; STEPPER;

ABERRATIONS; ALIGNMENT; COMPUTER SIMULATION; COST EFFECTIVENESS; DEGREES OF FREEDOM (MECHANICS); ERROR ANALYSIS; LENSES; MEASUREMENT THEORY;

LITHOGRAPHY;

EID: 4344678636     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.534359     Document Type: Conference Paper

References (6)

1. S. Chang, S. DeMoor, J. Brown, C. Atkinson, J. Roberge, "An Improved Method to Determine Optimal Alignment Sampling Layouts", Proc. of the SPIE, vol. 5038-9, pp.70-80, Feb 2003
2. CJ Gould, F Goodwin, W Roberts, "Overlay Measurement: Hidden Error", SPIE proceedings vol. 3998, San Jose, CA, Feb 2000, pg. 400
3. TA Brunner, Interface'96, "Impact of Lens Aberrations on Optical Lithography", pp. 1-27, Olin Microelectronics Materials., Inc., 1996
4. S. Chang, et., al., ibid
5. S. Chang, et., al., ibid
6. S. Chang, et., al., ibid