ARC stack development for hyper NA imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 3, 2007, Pages

  Farys, Vincent ^a   Warrick, Scott ^b   Chaton, Catherine ^c   Chapon, Jean Damien ^a  

^a STMICROELECTRONICS   (France)

^b Freescale   (France)

^c CEA LETI   (France)

Author keywords

Anti reflective coating; Bulk effect; Multilayer ARC; Process capabilities; Swing curves

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTOLITHOGRAPHY; POLARIZATION; REFLECTIVE COATINGS;

ANTI REFLECTIVE COATING; BULK EFFECT; MULTILAYER ARC; PROCESS CAPABILITIES; SWING CURVES; WATER IMMERSION;

IMAGE ANALYSIS;

EID: 35148884748     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.712882     Document Type: Conference Paper

References (7)

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