How AR coatings stack up

Semiconductor International

Volumn 28, Issue 10, 2005, Pages 45-50

  Peters, Laura ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; THIN FILMS; WSI CIRCUITS;

ORGANIC CVD FILMS; ORGANIC MATERIALS; SPIN-ON ORGANIC FILMS;

ANTIREFLECTION COATINGS;

EID: 26444448938     PISSN: 01633767     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Review

References (2)

1. L. Peters, "Photoresists Meet the 193 nm Milestone," Semiconductor International, February 2005, p. 38.
2. T. Hosono et al., "High Etch-Resistant Silicon Containing Bilayer Resist: Lithographic Performance and Outgassing Studies," 22nd Conf. on Photopolymer Science and Technology, 2003.