Dual anti-reflection layers for ARC/hard-mask applications

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6154 III, Issue , 2006, Pages

  Huang, Victor ^a   Wu, T S ^a   Yang, Mars ^a   Lin, Francis ^a   Yang, Elvis ^a   Yang, T H ^a   Chen, K C ^a   Ku, Joseph ^a   Lu, C Y ^a  

^a MACRONIX INTERNATIONAL CO LTD   (Taiwan)

Author keywords

Antireflective coatings; CD uniformity; Dual DARC; Hard masks; High NA

Indexed keywords

CONTROL SYSTEMS; DIELECTRIC PROPERTIES; FEATURE EXTRACTION; OPTICAL DEVICES; PHOTOLITHOGRAPHY; THICKNESS CONTROL; THIN FILMS;

ANTIREFLECTIVE COATINGS; CD UNIFORMITY; DUAL DARC; HARD-MASKS; HIGH NA;

OPTICAL ENGINEERING;

EID: 33745796147     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656093     Document Type: Conference Paper

References (5)

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