Approximation of three dimensional mask effects with two dimensional features

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 446-454

  Bai, Min ^a   Melvin III, Lawrence S ^a   Yan, Qiliang ^a   Shiely, James P ^a   Falch, Bradley J ^a   Fu, Chong Cheng ^b   Wang, Ruoping ^b  

^a SYNOPSYS INC   (United States)

^b FREESCALE SEMICONDUCTOR INC   (United States)

Author keywords

3D mask effect; AAPSM; Boundary layers; OPC; Thin mask approximation

Indexed keywords

3D MASK EFFECTS; ALTERNATING APERTURE PHASE SHIFT MASKS (AAPSM); OPTICAL PROXIMITY CORRECTION (OPC); THIN MASK APPROXIMATION;

BOUNDARY LAYERS; CALIBRATION; OPTICAL RESOLVING POWER; PHASE SHIFT; PHOTOLITHOGRAPHY; THREE DIMENSIONAL; WSI CIRCUITS;

MASKS;

EID: 24644485238     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600547     Document Type: Conference Paper

References (5)

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3. P. Yan, "Understanding Bossung Curve Asymmetry and Focus Shift Effect in EUV Lithography". Proc. of SPIE, Vol. 4562, 1-9 (2001)
4. M. Lam, K. Adams, A. R. Neureuther, "Domain Decomposition Methods for Simulation of Printing and Inspection of Phase Defects", Proc. of SPIE, Vol. 5040, 1492-1501 (2003).
5. J. Tirapu-Azpiroz, E. Yablonovitch, "Boundary Layer Model to Account for Thick Mask Effects in Photolithography", Proc. of SPIE, Vol. 5040, 1611-1619 (2003).