Determination of mask induced polarization effects on AltPSM mask structures

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5853 PART I, Issue , 2005, Pages 194-201

  Höllein, Ingo ^a   Teuber, Silvio ^a   Bubke, Karsten ^a  

^a Advanced Mask Technology Centre GmbH and Co KG   (Germany)

Author keywords

50 nm lithography; AltPSM; High NA; Immersion; Polarization

Indexed keywords

BIREFRINGENCE; LIGHT POLARIZATION; LIGHT TRANSMISSION; PHOTOLITHOGRAPHY;

50 NM LITHOGRAPHY; ALTPSM; HIGH NA; IMMERSION;

MASKS;

EID: 28544451598     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.617432     Document Type: Conference Paper

References (7)

1. Silvio Teuber, Kartsen Bubke, Ingo Höllein, Determination of mask induced polarization effects occurring in Hyper NA immersion lithography in SPIE 2005
2. Estroff, Y. Fan, A. Bourov, F. Cropanese, N. Lafferty, L. Zavyalova and B. Smith, Mask induced Polarization, SPIE2004
3. J. Heber, A. Gatto, N. Kaiser, Spectrophotometry in the vacuum UV, Boulder 2002
4. Web site reference: http://www.gsolver.com/
5. K. Bubke, S. Teuber, I. Hoellein, H. Becker, H. Seitz, U. Buttgereit, Investigation of Polarization Effects on new Mask Materials, t.b.p. in SPIE 2005
6. B.J. Lin, Plenary Speech at SPIE, SPIE Proc. Vol. 4688, p. 11, 2002
7. Donis G. Flagello, Steve Hansen, Bernd Geh, Michael Totzeck, Challenges with Hyper NA (NA>1) Polarization light Lithography for Sub λ/4 resolution in SPIE2005