The preparation and properties of a kind of sulfonium salt PAG applicable for 193 nm photoresist

Ganguang Kexue yu Guanghuaxue/Photographic Science and Photochemistry

Volumn 23, Issue 1, 2005, Pages 48-54

  Wang, Wen Jun ^a   Li, Hua Min ^a   Wang, Li Yuan ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

Chemical amplification; Photoacid generator; Photoresist; Sulfonium salt

Indexed keywords

EID: 13944273386     PISSN: 10003231     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)