Newly developed acrylic copolymers for ArF photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4690 II, Issue , 2002, Pages 615-622

  Kamon, Yoshihiro ^a   Momose, Hikaru ^a   Kuwano, Hideaki ^a   Fujiwara, Tadayuki ^a   Fujimoto, Masaharu ^a  

^a MITSUBISHI CHEMICAL CORPORATION   (Japan)

Author keywords

Acrylic copolymer; ArF photoresist; DMMB; Etching durability; Hydrophilic part; OTDMA; Solubility

Indexed keywords

ACRYLIC MONOMERS; ACRYLICS; COPOLYMERS; ESTERS; ETCHING; HYDROPHILICITY; SOLUBILITY;

ACRYLIC COPOLYMERS;

PHOTORESISTS;

EID: 0036030260     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.474263     Document Type: Conference Paper

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