Studies on a cross-linking type positive 193nm photoresist material

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 I, Issue , 2006, Pages

  Wang, Liyuan ^a   Guo, Xin ^a   Chu, Zhanxing ^a   Wang, Wenjun ^a  

^a BEIJING NORMAL UNIVERSITY   (China)

Author keywords

193nm; Acrylpimaric acid; Divinyl ether; PAG; Positive photoresist

Indexed keywords

CROSSLINKING; ETHERS; ORGANIC ACIDS; PHOTOSENSITIVITY; SOLUTIONS;

193NM; ACRYLPIMARIC ACID; DIVINYL ETHER; PAG; POSITIVE PHOTORESIST;

PHOTORESISTS;

EID: 33745619839     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656001     Document Type: Conference Paper

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