Feasibility study of embedded binary masks

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 II, Issue , 2006, Pages

  Cangemi, Michael ^a,b   Philipsen, Vicky ^a   Leunissen, Leonardus H A ^a   Taylor, Darren ^c  

^a IMEC   (Belgium)

^b IMEC   (Belgium)

^c Photronics ^*  (United States)

Author keywords

Embedded binary mask; Hyper NA lithography

Indexed keywords

COMPUTER SIMULATION; COST EFFECTIVENESS; DIFFRACTION; ELLIPSOMETRY; IMAGING SYSTEMS; PHOTOLITHOGRAPHY;

EMBEDDED BINARY MASKS; HYPER NA LITHOGRAPHY; MASK BLANK; MASK TOPOGRAPHY;

MASKS;

EID: 33846602308     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686290     Document Type: Conference Paper

References (5)

1. M.Yoshizawa, et al., "Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography", Proc. SPIE 5853, 243 (2005).
2. M.Yoshizawa, et al., "Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA lithography", SPIE 6154-51,1E, (2006).
3. nd Immersion Symposium, Brugge (2005).
4. M.H. Bennett et al., "Experimental measurements of diffraction for periodic patterns by 193nm polarized radiation compared to rigorous EM simulations", Proc. of SPIE 5754, 599 (2005).
5. M.Yoshizawa, et al., "Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography", SPIE 6283, IG, (2006).