Investigation of polarization effects on new mask materials

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 1, 2005, Pages 587-598

  Bubke, Karsten ^a   Teuber, Silvio ^a   Hoellein, Ingo ^a   Becker, Hans ^b   Seitz, Holger ^b   Buttgereit, Ute ^b  

^a Advanced Mask Technology Centre GmbH and Co KG   (Germany)

^b Schott Lithotec AG   (Germany)

Author keywords

Binary masks; High NA; High transmission masks; Immersion lithography; Polarization

Indexed keywords

COMPUTER SIMULATION; DIFFRACTION; ELLIPSOMETRY; LIGHT ABSORPTION; MASKS; REFLECTOMETERS;

BINARY MASKS; HIGH NA; HIGH TRANSMISSION MASKS; IMMERSION LITHOGRAPHY;

LIGHT POLARIZATION;

EID: 25144474879     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599688     Document Type: Conference Paper

References (12)

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8. A. Erdmann, "Mask Modeling in the Low Kl and Ultrahigh NA Regime: Phase and Polarization Effects", to be published.
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10. GSOLVER Product Site, http://www.gsolver.com
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12. Lord Rayleigh, "On the remarkable Case of Diffraction Spectra Described by Prof. Wood", Philosophical Magazine, July 1907.