Development of optical component for EUV phase-shift microscopes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6517, Issue PART 2, 2007, Pages

  Mizuta, Yoshio ^a,c   Osugi, Masafumi ^a,c   Kishimoto, Jyunki ^a,c   Sakaya, Noriyuki ^b,c   Hamamoto, Kazuhiro ^b,c   Watanabe, Takeo ^a,c   Kinoshita, Hiroo ^a,c  

^a UNIVERSITY OF HYOGO   (Japan)

^b HOYA CORPORATION   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXTREME ULTRAVIOLET LITHOGRAPHY; MOLYBDENUM; MULTILAYER FILMS; OPTICAL MICROSCOPY; PHASE SHIFT; SPUTTERING;

PHASE SHIFT MICROSCOPES; SEMITRASPARENT MULTILAYER FILM; SILICON FILMS;

OPTICAL SYSTEMS;

EID: 35148869598     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711997     Document Type: Conference Paper

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