Experimental results obtained using extreme ultraviolet laboratory tool at New SUBARU

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 12 B, 2000, Pages 6771-6776

  Kinoshita, Hiroo ^a   Watanabe, Takeo ^a  

^a UNIVERSITY OF HYOGO   (Japan)

Author keywords

Aspherical mirror; Chemically amplified resist; Extreme ultraviolet lithography; Scanning stage; Single layer resist

Indexed keywords

MIRRORS; OPTICAL DESIGN; PHOTORESISTS; ULTRAVIOLET RADIATION;

ULTRAVIOLET LITHOGRAPHY;

INDUSTRIAL OPTICS;

EID: 0034430260     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.6771     Document Type: Article

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