Development of beam splitter using multilayer membrane for extreme ultraviolet phase-shift microscopes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 B, 2005, Pages 5540-5543

  Hosokawa, Nobuyuki ^a,b   Watanabe, Takeo ^b,c   Sakaya, Noriyuki ^b,d   Shoki, Tsutomu ^b,d   Hamamoto, Kazuhiro ^b,c   Kinoshita, Hiroo ^b,c  

^a Nitto Thin Film Laboratories Co Ltd   (Japan)

^b JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

^c UNIVERSITY OF HYOGO   (Japan)

^d HOYA CORPORATION   (Japan)

Author keywords

Beam splitter; EUV phase shift microscope; Multilayer; Stress

Indexed keywords

ARGON; MICROSCOPES; ULTRAVIOLET RADIATION;

BEAM SPLITTER; EUV PHASE-SHIFT MICROSCOPE; STRESS;

MULTILAYERS;

EID: 31844437246     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5540     Document Type: Article

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